AMAT Applied Materials 9090-00962真空控制底盘

AMAT Applied Materials  9090-00962真空控制底盘

1.产 品 资 料 介 绍：

• 薄膜沉积：在化学气相沉积（CVD）、物理气相沉积（PVD）、原子层沉积（ALD）等薄膜沉积工艺中，需要精确控制真空环境来确保薄膜的均匀性和质量。该真空控制底盘可提供稳定的真空条件，保证气体分子能够准确地沉积在晶圆表面，形成高质量的薄膜，如半导体器件中的绝缘层、导电层等。
• 蚀刻：蚀刻工艺是将晶圆表面不需要的材料去除，以形成精确的电路图案。AMAT 9090-00962 真空控制底盘可调节工艺压力，实现精准的材料去除，通过与电容式真空计、皮拉尼真空计等配合，确保蚀刻的一致性和高工艺可重复性。
• 光刻：光刻工艺中，真空控制对于维持光刻设备的稳定性和准确性至关重要。该真空控制底盘可确保工艺系统内精准的压力控制，真空元件能保证无泄漏连接，有助于提高光刻工艺的稳定性和图案转移的精度，从而影响半导体器件的性能和尺寸缩小。
• 晶体生长：在半导体晶体生长过程中，如硅晶体拉制，需要精确控制生长腔内的工艺压力，以生长出无瑕的晶体。AMAT 的真空控制底盘可以为晶体生长提供稳定的真空环境，有助于提高半导体材料的质量和纯度。
• 先进封装：先进封装工艺对真空控制系统的精度要求极为严格，任何微小的误差都可能影响到最终产品的性能。AMAT 9090-00962 真空控制底盘可用于先进封装中的真空焊接、真空灌封等工艺，确保封装过程的可靠性和一致性。

AMAT Applied Materials  9090-00962真空控制底盘 英文资料：

AMAT Applied Materials 9090-00962 vacuum controlled chassis is mainly used in the semiconductor manufacturing field, as follows:

Thin film deposition: In thin film deposition processes such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and atomic layer deposition (ALD), precise control of the vacuum environment is required to ensure the uniformity and quality of the thin film. This vacuum control chassis can provide stable vacuum conditions, ensuring that gas molecules can accurately deposit on the wafer surface, forming high-quality thin films, such as insulation layers, conductive layers, etc. in semiconductor devices.

Etching: The etching process removes unwanted materials from the surface of the wafer to form precise circuit patterns. AMAT 9090-00962 vacuum control chassis can adjust process pressure to achieve precise material removal. By cooperating with capacitive vacuum gauges, Pirani vacuum gauges, etc., it ensures consistent etching and high process repeatability.

Photolithography: Vacuum control is crucial for maintaining the stability and accuracy of lithography equipment in the lithography process. The vacuum control chassis ensures precise pressure control within the process system, and the vacuum components ensure leak free connections, which helps improve the stability of photolithography processes and the accuracy of pattern transfer, thereby affecting the performance and size reduction of semiconductor devices.

Crystal growth: In the process of semiconductor crystal growth, such as silicon crystal drawing, precise control of the process pressure inside the growth chamber is required to grow flawless crystals. AMAT's vacuum controlled chassis can provide a stable vacuum environment for crystal growth, which helps improve the quality and purity of semiconductor materials.

Advanced packaging: Advanced packaging processes have extremely strict precision requirements for vacuum control systems, and any small error may affect the performance of the final product. The AMAT 9090-00962 vacuum control chassis can be used for advanced packaging processes such as vacuum welding and vacuum sealing, ensuring the reliability and consistency of the packaging process.

 AMAT Applied Materials 9090-00962真空控制底盘 产品展示      

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3.其他产品

BENTLY 3500/33 149992-01 输入输出模块
ABB  ACS-RTAC-01 64610805接口模块
NI CPCI-3840 单板计算机

4.其他英文产品

BENTLY 135473-01 Monitor module
BENTLY 135489-04 Temperature module
BENTLY 136711-01 Temperature module

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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