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Edwards NRY4JC000XS 真空泵 产品英文介绍
#Edwards NRY4JC000XS Vacuum Pump Product Features
Edwards NRY4JC000XS dry vacuum pump, designed for exhaust use in semiconductor processes, features the following:
1. Fully dry oil-free structure to avoid oil mist pollution of the process chamber
2. Anti corrosion treatment of pump chamber, capable of suctioning corrosive process gases
3. Configure multiple nitrogen purging channels to suppress dust accumulation
4. Driven by a variable frequency motor, it automatically adjusts speed and saves energy according to the load
5. Extreme vacuum stability, capable of long-term continuous heavy load operation
6. Water cooling and heat dissipation design, controllable temperature rise under high temperature conditions
7. The extraction flow rate is stable and suitable for exhaust in various processes
8. Built in fault self check, quickly output alarm information
9. Equipped with communication interface, supporting remote monitoring by upper computer
10. Equipped with anti backflow protection to prevent gas from flowing back into the chamber
11. Compact overall structure, saving equipment installation space
12. Low operating vibration, suitable for clean workshop environment
13. Meet SEMI related semiconductor safety standards
14. Direct extraction at atmospheric pressure, without the need for additional front-end pumps
15. Modular components, easy to disassemble and maintain
Edwards NRY4JC000XS vacuum pump is corrosion-resistant, reliable, and low maintenance, suitable for semiconductor etching and thin film deposition vacuum conditions.

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218




