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TMP-3203LMEC-K1涡轮分子泵

发布时间:2026-09-04人气:
  • TMP-3203LMEC-K1涡轮分子泵
  • TMP-3203LMEC-K1涡轮分子泵
  • TMP-3203LMEC-K1涡轮分子泵

TMP-3203LMEC-K1涡轮分子泵  

1.产 品 资 料 介 绍:

Shimadzu TMP‑3203LMEC‑K1 涡轮分子泵,岛津磁悬浮分子泵,半导体腔体实现超高真空的核心部件,真空指标好坏和它运行状态息息相关。
产品特点
1、磁悬浮轴承无机械接触,内部无油,杜绝返油问题,保护腔体不受污染
2、叶轮做防腐处理,能够应对各类腐蚀性工艺气体,延缓泵体损耗
3、水冷散热设计,大负载工况下热量散出快,适合 24 小时不间断生产
4、安装姿态灵活,水平、垂直都可以装配,适配不同机台空间布局
5、内置运行数据采集,转速温度异常可输出告警,方便运维人员做寿命预判
产品参数
1、额定转速 21000rpm,大抽速,负责腔体超高真空建立
2、需要配套分子泵驱动控制器协同工作
3、进气法兰 ISO320‑F,排气 KF40,对接前级干式泵
4、具备信号通讯接口,上传转速、温度、故障信息
5、可长期在半导体工艺废气环境下稳定工作
应用领域
1、刻蚀设备工艺腔体高真空抽取
2、PVD、CVD 薄膜沉积设备主真空单元
3、光刻机负载锁腔体超高真空场景
4、各类需要抗腐蚀气体的真空制程设备
5、产线坏泵替换维修备件
Shimadzu TMP‑3203LMEC‑K1 涡轮分子泵一旦转速异常或者真空跌落,会直接造成机台跳工艺,耽误产线生产进度

TMP-3203LMEC-K1涡轮分子泵  产品英文介绍

Shimadzu TMP 3203LMEC K1 turbo molecular pump, Shimadzu magnetic levitation molecular pump, and semiconductor cavity are the core components for achieving ultra-high vacuum. The quality of vacuum indicators is closely related to their operating status.

Product Features

1. Magnetic levitation bearings have no mechanical contact, no oil inside, eliminate oil return problems, and protect the cavity from contamination

2. The impeller undergoes anti-corrosion treatment, which can cope with various corrosive process gases and delay pump body loss

3. Water cooling and heat dissipation design, fast heat dissipation under high load conditions, suitable for 24-hour uninterrupted production

4. Flexible installation posture, can be assembled horizontally or vertically, suitable for different machine space layouts

5. Built in operation data collection, output alarm for abnormal speed and temperature, convenient for operation and maintenance personnel to make life prediction

Product Specifications

1. Rated speed 21000rpm, high pumping speed, responsible for establishing ultra-high vacuum in the chamber

2. Need to work together with a molecular pump driver controller

3. Inlet flange ISO320-F, exhaust KF40, connected to front stage dry pump

4. Equipped with signal communication interface, upload speed, temperature, and fault information

5. Can work stably in the semiconductor process exhaust gas environment for a long time

Application Areas

1. Etching equipment process chamber high vacuum extraction

2. PVD, CVD thin film deposition equipment main vacuum unit

3. Lithography machine load lock chamber ultra-high vacuum scene

4. Various vacuum process equipment requiring corrosion-resistant gases

5. Replacement and repair spare parts for broken pumps on the production line

Once the rotational speed of Shimadzu TMP 3203LMEC K1 turbo molecular pump is abnormal or the vacuum drops, it will directly cause the machine to skip the process and delay the production progress of the production line

TMP-3203LMEC-K1涡轮分子泵  产品展示

TMP-3203LMEC-K1.webp (3).jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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