ENI RPDG-20ENI RPDG-200Z-12029直流等离子体发生器
1.产 品 资 料 介 绍：
ENI RPDG-20ENI RPDG-200Z-12029直流等离子体发生器 产品英文介绍
ENI RPDG-200Z-12029 DC plasma generator
Product Features
1 pulse DC output stable plasma ignition uniform
2. Built in arc suppression reduces ignition and protects the internal components of the chamber
3. Smooth power regulation process with good repeatability
4. Strong anti-interference ability, suitable for semiconductor cabinet environment
5. Easy disassembly and replacement to shorten equipment downtime and maintenance time
Product Specifications
1. Three phase industrial AC power supply
Rated 20kW pulse DC power output
3. Water cooling and heat dissipation, long-term operation, stable temperature control
4. Support real-time uploading of operational data through remote communication
5 standard cabinet installation dimensions
Application Areas
1. Plasma power supply for semiconductor PVD sputtering process
Pulse plasma excitation for vacuum coating equipment
3 Material surface modification treatment power unit
4 Vacuum chamber plasma cleaning supporting equipment
Replacement of spare parts for MKS ENI plasma power supply
This ENI RPDG-200Z-12029 pulse DC plasma generator belongs to the MKS brand and is commonly used for the maintenance and replacement of thin film process equipment
ENI RPDG-20ENI RPDG-200Z-12029直流等离子体发生器 产品展示
视频展示
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| 369-HI-R-0-F-0-0-E | 531X305NTBAPG1 | IC3603A200A |
| 369-HI-R-0-0-0-0-E | 531X305NTBANG1 | 0271284-000 |
| 369-HI-R-0-0-0-0-0 | 531X305NTBAMG1 | IC3603A200 |
| 369-HI-R-0-0-0-0 | 531X305NTBALG1 | IC3603A177CH6 |
| 369-HI-R-0-0-0 | 531X305NTBAJG1 | IC3603A177CH2 |
| 369-HI-B-M-0-0 | 531X305NTBAHG1 | IC3603A177CG6 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
