1.产 品 资 料 介 绍:
Hitachi CR-712VC晶圆搬运清洁机器人 产品英文介绍
Hitachi CR-712VC Wafer Handling and Cleaning Robot
Product Features
The clean arm structure has low dust emission and meets the standards for use in semiconductor dust-free workshops
Multi axis coordinated motion ensures smooth handling and reduces the risk of wafer fragments and scratches
Integrated wafer surface dust removal function, completing simple cleaning synchronously during the picking and placing process
High speed and precise positioning, stable docking of machine chuck and wafer box
Built in fault diagnosis and safety protection, automatic shutdown protection for abnormal states
Application Areas
Semiconductor EFEM front-end module wafer transfer operation
Transfer between wafer cleaning machine wafer box and process chamber
Thin film deposition equipment wafer loading and unloading handling
Automatic handover of plasma etching equipment sheets
Replacement of old robot spare parts for semiconductor production lines
Automatic sample conveying station for wafer testing equipment
Chip equipment renovation and transformation supporting handling unit
Automatic picking and placing of crystal round samples on the R&D experimental platform
Ion implantation machine, dust-free environment, wafer transfer
Clean transfer process of polished wafers
The robot model that combines wafer handling and surface cleaning functions is Hitachi CR-712VC.
Hitachi CR-712VC晶圆搬运清洁机器人 产品展示

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| PMB33C-20216-03 | AMAT 0100-09084 | PFTL101AE 2.0KN 3BSE004213R1 |
| PMB33C-20216-02 | 07BE61R1 | XV7713b |
| PMB33C-20216-01 | NASM02 | N32HRLK-LNK-NS-00 |
| PMB33C-20216-00 | PHKRMPBA2000A | P21NRXB-JNF-NS-00 |
| PMB33C-20214-03 | IMMPI01 | N31HRFL-LNK-NS-00 |
| PMB33C-20214-02 | ICSO08Y1 | M21NRXB-LSS-NS-03 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218




