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AE 3152012-041直流电源模块

发布时间:2026-09-28人气:
  • AE 3152012-041直流电源模块
  • AE 3152012-041直流电源模块
  • AE 3152012-041直流电源模块

AE 3152012-041直流电源模块  

1.产 品 资 料 介 绍:

AE 3152012-041 直流电源模块
产品特点
稳定直流功率输出,电压波动小保障薄膜工艺一致性
内置过压过流过热多重保护,减少机台停机故障
支持机台通讯信号交互,可远程调节输出参数
水冷散热结构,长时间满载运行温升可控
标准化机架安装结构,现场拆装维护简单
应用领域
半导体溅射镀膜工艺直流供电
PVD 腔体靶材驱动电源供给
等离子处理设备直流功率输出
半导体产线电源备件替换维修
芯片设备翻新改造配套供电单元
研发实验镀膜机台直流电源单元
晶圆表面改性工艺功率供给
真空沉积设备腔体供电模块
半导体检测设备大功率直流供电
光学薄膜制备工艺电源控制
这款适配半导体溅射工艺的直流电源模块型号为 AE 3152012-041。

AE 3152012-041直流电源模块  产品英文介绍

AE 3152012-041 DC power module

Product Features

Stable DC power output, small voltage fluctuations ensure consistency of thin film process

Built in multiple protections for overvoltage, overcurrent, and overheating to reduce machine shutdown faults

Support machine communication signal interaction and remote adjustment of output parameters

Water cooled cooling structure, controllable temperature rise during long-term full load operation

Standardized rack installation structure, easy on-site disassembly and maintenance

Application Areas

DC power supply for semiconductor sputtering coating process

PVD cavity target driving power supply

DC power output of plasma processing equipment

Replacement and maintenance of spare parts for semiconductor production line power supply

Refurbishment and renovation of chip equipment with supporting power supply unit

Research and development of DC power supply unit for experimental coating machine

Power supply for wafer surface modification process

Vacuum deposition equipment chamber power supply module

High power DC power supply for semiconductor testing equipment

Power control for optical thin film preparation process

The model of this DC power module suitable for semiconductor sputtering process is AE 3152012-041.

AE 3152012-041直流电源模块 产品展示

3152012-041.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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