TEL Tokyo Electron 3D80-000214-V4控制器模块
1.产 品 资 料 介 绍：
产品名称：
Tokyo Electron 3D80-000214-V4 控制器模块 是一款专用于半导体制造设备中的智能控制部件，主要用于实现设备内部工艺流程、子系统管理与精密参数调控功能。该模块是 TEL（Tokyo Electron）高端设备平台（如蚀刻、沉积等系统）中的核心控制单元之一。
一、产品功能定位
模块类型：工艺控制器 / 系统控制器
功能特性：
管理设备运行逻辑、控制指令及状态监控；
与设备主控系统进行实时数据交互；
控制子系统如气体流量、温度、真空、压力、RF功率等的调节执行；
支持外部信号输入输出、报警响应、故障诊断等功能。
二、应用领域分析
1. 蚀刻设备（Etch Systems）
控制腔体内的气体比例、压力控制、RF 功率输出；
管理腔体门、提升机构、加热板等子部件的动作逻辑；
与上位 MES 系统和设备主机（如 PLC 或工业 PC）进行通信。
2. 化学气相沉积设备（CVD / ALD）
实时控制沉积周期与薄膜厚度；
调节 precursor 气体通入量、温度设定、真空状态；
提供工艺稳定性数据采集接口。
3. 清洗 / 显影设备
管理清洗喷头、水气比例、电机运动、烘干等流程；
实现动作顺序、时间设定与异常监控。
英文资料：
The Tokyo Electron 3D80-000214-V4 controller module is an intelligent control component specifically designed for semiconductor manufacturing equipment, mainly used to implement internal process flow, subsystem management, and precision parameter control functions of the equipment. This module is one of the core control units in TEL (Tokyo Electron) high-end equipment platforms, such as etching, deposition, and other systems.
1、 Product functional positioning
Module Type: Process Controller/System Controller
Functional features:
Manage equipment operation logic, control instructions, and status monitoring;
Real time data exchange with the device control system;
Control the execution of subsystems such as gas flow rate, temperature, vacuum, pressure, RF power, etc;
Support functions such as external signal input and output, alarm response, and fault diagnosis.
2、 Application field analysis
Etch Systems etching equipment
Control the gas ratio, pressure control, and RF power output inside the chamber;
Manage the action logic of sub components such as cavity doors, lifting mechanisms, heating plates, etc;
Communicate with the upper MES system and equipment host (such as PLC or industrial PC).
2. Chemical vapor deposition equipment (CVD/ALD)
Real time control of sedimentation period and film thickness;
Adjust the precursor gas flow rate, temperature setting, and vacuum state;
Provide an interface for collecting process stability data.
3. Cleaning/developing equipment
Manage the processes of cleaning nozzles, water vapor ratio, motor movement, drying, etc;
Implement action sequence, time setting, and anomaly monitoring.
2.产 品 展 示
3.其他产品
4.其他英文产品
ASEA DSQC100 connector backplane
ASEA 2668 184-447 Communication Module
RadiSys 61-0475-12 Axis Control Module
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| SRF5348-4485-84-5-45BC-CU | SC402-001-T5 | SC903-024-01 |
| SRF5348-4485-84-45BC-CU | SC402D23T4 | SC902NN-001-01 |
| SRF3756-4996-84-5-56BC-CU | SC403044T3 | SC942-001-01 |
| SRF3752-4984-84-5-56BC-CU | SC402-001-T2 | SC753B-001-02 |
| SRF3736-4983-84-7-56HC-CU | SC403-013-T3 | SC755A-001-01 |
| SRF3736-4983-84-5-56BC-CU | SC403-001-T5 | SC754A-001-02 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
