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Daihen TW39-000021-11 射频自动匹配器

发布时间:2026-08-28人气:
  • Daihen TW39-000021-11 射频自动匹配器
  • Daihen TW39-000021-11 射频自动匹配器
  • Daihen TW39-000021-11 射频自动匹配器

Daihen TW39-000021-11 射频自动匹配器 

1.产 品 资 料 介 绍:

Daihen TW39‑000021‑11 为半导体工艺射频自动匹配器,实时调节阻抗,降低反射功率,保障等离子腔室功率稳定传输。
应用领域
1. 半导体介质刻蚀设备阻抗匹配调控
2.PECVD 薄膜沉积腔体射频阻抗调节
3. 远程等离子源腔体清洗功率匹配
4. 干法刻蚀晶圆制程等离子负载适配
5. 芯片灰化去胶工艺射频回路调谐
6. 原子层沉积 ALD 设备射频匹配
7. 化合物半导体等离子工艺系统
8.PVD 镀膜机射频负载动态适配
9. 半导体负载锁腔等离子处理
10. 半导体工艺设备射频电源配套单元
产品参数
1. 适配 13.56MHz 射频频段,宽阻抗自动调谐范围
2. 快速匹配响应,工艺切换后迅速降低反射功率
3. 水冷散热结构,支持 7×24 小时产线连续运行
4. 搭载模拟及数字通讯接口,对接设备主控系统
5. 内置过功率、过温、驻波比超限保护告警
综上,Daihen TW39‑000021‑11 匹配调谐速度快,抗工艺阻抗波动,是半导体等离子工艺射频链路关键阻抗匹配部件。

Daihen TW39-000021-11 射频自动匹配器 产品英文介绍

Daihen TW39-000021-11 is a semiconductor process RF automatic matching device that adjusts impedance in real-time, reduces reflected power, and ensures stable power transmission in the plasma chamber.

Application areas

1. Impedance matching control of semiconductor dielectric etching equipment

2. RF impedance adjustment of PECVD thin film deposition chamber

3. Power matching for remote plasma source chamber cleaning

4. Adaptation of plasma load in dry etching wafer process

5. Chip ashing and debonding process RF circuit tuning

6. RF matching of atomic layer deposition ALD equipment

7. Compound semiconductor plasma process system

8. Dynamic adaptation of RF load for PVD coating machine

9. Plasma treatment of semiconductor load lock cavity

10. RF power supply supporting unit for semiconductor process equipment

Product Parameters

1. Suitable for 13.56MHz RF frequency band, wide impedance automatic tuning range

2. Fast matching response, quickly reducing reflected power after process switching

3. Water cooling and heat dissipation structure, supporting continuous operation of 7 × 24-hour production line

4. Equipped with analog and digital communication interfaces to interface with the main control system of the equipment

5. Built in over power, over temperature, and standing wave ratio over limit protection alarms

In summary, Daihen TW39-000021-11 has fast matching and tuning speed, and is resistant to process impedance fluctuations, making it a key impedance matching component for semiconductor plasma process RF links.

Daihen TW39-000021-11 射频自动匹配器  产品展示

TW39-000021-11.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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