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AE 31512411-362 直流电源模块

发布时间:2026-09-03人气:
  • AE 31512411-362 直流电源模块
  • AE 31512411-362 直流电源模块
  • AE 31512411-362 直流电源模块

AE 31512411-362 直流电源模块 

1.产 品 资 料 介 绍:

AE 31512411‑362 直流电源模块,半导体磁控溅射设备专用大功率直流供电单元,输出平稳,适配等离子薄膜工艺。
产品特点:
1. 闭环稳压稳流控制,输出纹波低,保障等离子工艺重复性
2. 具备过压、过流、过热、电弧抑制多重保护,保护靶材与腔体
3. 支持远程模拟信号控制,可对接设备主机调节功率参数
4. 机架式模块化结构,拆装更换方便,缩短设备停机时间
5. 抗射频干扰,可在强电磁的半导体机柜环境稳定运行
产品参数:
1. 设备类型:半导体工艺直流电源模块
2. 支持恒压、恒流双模式输出
3. 带电弧快速检测与抑制功能
4. 模拟 IO 通讯接口,支持外部设定与状态回读
5. 工作温度:5‑50℃,机柜机架安装
应用领域:
1. 磁控溅射 PVD 镀膜设备靶材供电
2. 半导体金属薄膜沉积工艺供电
3. 真空等离子表面处理设备直流源
4. 薄膜涂层工业真空工艺设备
5. 半导体设备腔体配套直流供电单元
优秀的电弧抑制与工艺输出稳定性,让 AE 31512411‑362 成为 PVD 薄膜工艺的核心供电部件。

AE 31512411-362 直流电源模块 产品英文介绍

AE 31512411-362 DC power module, a high-power DC power supply unit dedicated to semiconductor magnetron sputtering equipment, with stable output and suitable for plasma thin film technology.

Product Features:

1. Closed loop voltage and current control, low output ripple, ensuring the repeatability of plasma process

2. It has multiple protections including overvoltage, overcurrent, overheating, and arc suppression to protect the target material and cavity

3. Support remote analog signal control and can be connected to the device host to adjust power parameters

4. Rack mounted modular structure, easy disassembly and replacement, reduces equipment downtime

5. Anti RF interference, able to operate stably in strong electromagnetic semiconductor cabinet environments

Product Parameters:

1. Equipment type: Semiconductor process DC power module

2. Supports dual mode output of constant voltage and constant current

3. Rapid detection and suppression function of charged arc

4. Simulate IO communication interface, support external settings and status feedback

5. Working temperature: 5-50 ℃, cabinet rack installation

Application fields:

1. Power supply for target material of magnetron sputtering PVD coating equipment

2. Power supply for semiconductor metal thin film deposition process

3. DC source for vacuum plasma surface treatment equipment

4. Thin film coating industrial vacuum process equipment

5. DC power supply unit for semiconductor equipment cavity matching

Excellent arc suppression and process output stability make AE 31512411-362 the core power supply component for PVD thin film processes.

AE 31512411-362 直流电源模块 产品展示

31512411-362.webp.jpg

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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