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AE 3155999-247能量射频导航仪

发布时间:2026-09-03人气:
  • AE 3155999-247能量射频导航仪
  • AE 3155999-247能量射频导航仪
  • AE 3155999-247能量射频导航仪

AE 3155999-247能量射频导航仪 

1.产 品 资 料 介 绍:

AE 3155999‑247 射频导航匹配器,半导体等离子工艺 Navigator II 数字阻抗匹配单元,实现射频电源与工艺腔体之间负载阻抗快速匹配,保障射频功率高效馈入腔体。
产品特点:
1. 数字调谐架构,响应速度快,腔体负载波动时快速完成阻抗匹配,压低反射功率
2. 集成电弧检测与保护,出现打火驻波异常快速切断,保护射频电源与腔体部件
3. 内置射频传感,实时采集功率、阻抗数据,便于工艺异常分析排查
4. 支持脉冲射频模式,适配脉冲等离子工艺,兼容多频工况抗互调干扰
5. 标准机架式结构,通讯接口丰富,适配 AMAT 等半导体设备平台集成
产品参数:
1. 设备类型:Navigator II 射频阻抗匹配网络
2. 工作频率:13.56MHz
3. 适配最大射频功率:6000W
4. 通讯:以太网、模拟 IO,支持远程参数读写
5. 工作温度:5‑50℃,机柜机架安装
应用领域:
1. 半导体刻蚀设备等离子腔体阻抗调配
2.PVD 磁控溅射薄膜沉积射频回路匹配
3.PECVD、腔室清洗等离子工艺系统
4. 射频电源与工艺腔体之间阻抗适配
5. 半导体量产设备射频回路配套单元
快速调谐与稳定的阻抗适配能力,让 AE 3155999‑247 成为半导体等离子工艺系统关键匹配部件

AE 3155999-247能量射频导航仪 产品英文介绍

AE 3155999-247 RF Navigation Matcher, a semiconductor plasma process Navigator II digital impedance matching unit, achieves fast impedance matching between the RF power supply and the process cavity, ensuring efficient feeding of RF power into the cavity.

Product Features:

1. Digital tuning architecture, fast response speed, quickly completes impedance matching when the cavity load fluctuates, and reduces reflected power

2. Integrate arc detection and protection, quickly cut off in case of abnormal standing waves during ignition, and protect the RF power supply and cavity components

3. Built in RF sensor, real-time collection of power and impedance data for easy analysis and troubleshooting of process abnormalities

4. Support pulse RF mode, adapt to pulse plasma technology, compatible with multi frequency working conditions and resistant to intermodulation interference

5. Standard rack mounted structure, rich communication interfaces, compatible with semiconductor equipment platforms such as AMAT integration

Product Parameters:

1. Device type: Navigator II RF impedance matching network

2. Operating frequency: 13.56MHz

3. Maximum RF power adaptation: 6000W

4. Communication: Ethernet, analog IO, supports remote parameter reading and writing

5. Working temperature: 5-50 ℃, cabinet rack installation

Application fields:

1. Impedance tuning of plasma chamber in semiconductor etching equipment

2. RF circuit matching for PVD magnetron sputtering thin film deposition

3.PECVD、 Chamber cleaning plasma process system

4. Impedance adaptation between RF power supply and process chamber

5. RF circuit supporting unit for semiconductor mass production equipment

The fast tuning and stable impedance adaptation capability make AE 3155999-247 a key matching component in semiconductor plasma process systems

AE 3155999-247能量射频导航仪 产品展示

3155999-247.webp (1).jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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