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AE 3152412-243发电机

发布时间:2026-09-07人气:
  • AE 3152412-243发电机
  • AE 3152412-243发电机
  • AE 3152412-243发电机

AE 3152412-243发电机  

1.产 品 资 料 介 绍:

AE 3152412‑243 是 Pinnacle 20K 射频发生器,属于半导体等离子设备大功率射频电源,多用于旧机备件替换,工艺稳定性可靠。
产品特点 5 条:
1、大功率射频输出,闭环功率控制,等离子工况下输出波动小。
2、高速弧光检测与抑制,遇到腔体打火快速降功率,保护工艺腔与器件。
3、支持脉冲调制模式,可适配多种等离子工艺的功率动态调节。
4、数字通讯加模拟双控制接口,方便对接主机系统做参数设定与状态读取。
5、大功率强制风冷机箱,风道优化,满负荷长时间运行散热稳定。
产品参数 5 条:
1、额定输出功率 20kW,工作频率 13.56MHz。
2、三相交流输入 208‑480VAC,适配半导体车间供电条件。
3、支持模拟 0‑10V、4‑20mA 以及数字通讯控制方式。
4、4U 机架式安装,风冷散热。
5、工作温度 0‑40℃,适合洁净设备舱连续运行。
应用领域 5 条:
1、半导体刻蚀设备射频等离子供电。
2、PVD 物理气相沉积设备工艺电源。
3、AMAT 晶圆处理设备原厂备件更换。
4、ICP 感应耦合等离子体工艺设备。
5、显示面板镀膜等离子工艺设备维修替换。
总的来说这款射频电源已经停产,市面大多是翻新备件,选型务必核对整机物料编码,确认匹配再上机。

AE 3152412-243发电机  产品英文介绍

AE 3152412-243 is a Pinnacle 20K RF generator, a high-power RF power supply for semiconductor plasma equipment, commonly used for replacing old machine spare parts, with reliable process stability.

5 product features:

1. High power RF output, closed-loop power control, with minimal output fluctuations under plasma conditions.

2. High speed arc detection and suppression, rapid power reduction when encountering chamber ignition, protecting process chambers and components.

3. Supports pulse modulation mode and can adapt to dynamic power adjustment of various plasma processes.

4. Digital communication and analog dual control interface, convenient for interfacing with the host system for parameter setting and status reading.

5. High power forced air cooling chassis, optimized air duct, stable heat dissipation during long-term operation at full load.

5 product parameters:

1. Rated output power of 20kW, operating frequency of 13.56MHz.

2. Three phase AC input 208-480VAC, suitable for power supply conditions in semiconductor workshops.

3. Supports analog 0-10V, 4-20mA, and digital communication control modes.

4. 4U rack mounted installation, air-cooled heat dissipation.

5. The working temperature is 0-40 ℃, suitable for continuous operation of clean equipment rooms.

5 application areas:

1. RF plasma power supply for semiconductor etching equipment.

2. PVD physical vapor deposition equipment process power supply.

3. Replacement of original spare parts for AMAT wafer processing equipment.

4. ICP inductively coupled plasma process equipment.

5. Maintenance and replacement of plasma process equipment for display panel coating.

In general, this RF power supply has been discontinued, and most of the market is for refurbished spare parts. When selecting, it is necessary to check the material code of the entire machine and confirm that it matches before putting it on the machine.

AE 3152412-243发电机  产品展示

3152412-243.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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