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AE 3155053-003射频发生器

发布时间:2026-09-07人气:
  • AE 3155053-003射频发生器
  • AE 3155053-003射频发生器
  • AE 3155053-003射频发生器

AE 3155053-003射频发生器  

1.产 品 资 料 介 绍:

AE 3155053‑003 是 Paramount 系列半导体射频发生器,多用于晶圆工艺设备备件替换,等离子控制表现稳定。
产品特点 5 条:
1、闭环功率调节,负载波动下输出功率不容易漂移,保障工艺一致性。
2、快速电弧检测处理,腔体打火瞬间降功率,减少腔体内部件损伤。
3、支持多级脉冲模式,可灵活适配不同等离子工艺的动态功率需求。
4、模拟量加数字双接口,方便设备主机实现远程设置与状态回读。
5、内部风道优化,风冷架构,车间长时间连续工作散热可靠。
产品参数 5 条:
1、额定输出功率 5kW,标准工作频率 13.56MHz。
2、三相输入 208‑480VAC,适配半导体工厂供电环境。
3、输出阻抗 50Ω,功率调节精度控制在 ±1% 以内。
4、标准 3U 机架安装,强制风冷散热。
5、工作环境温度 0‑45℃,适配洁净设备舱运行。
应用领域 5 条:
1、半导体刻蚀设备等离子射频供电。
2、PVD 薄膜沉积设备工艺电源备件。
3、PECVD 化学气相沉积设备配套使用。
4、晶圆处理设备旧机故障电源更换。
5、平板显示镀膜等离子工艺维修替换。
总的来说这款属于停产机型,市场以拆机翻新备件为主,采购上机前务必核对设备物料编号,确认匹配

AE 3155053-003射频发生器  产品英文介绍

AE 3155053-003 is a Paramount series semiconductor RF generator, commonly used for replacing spare parts in wafer process equipment, with stable plasma control performance.

5 product features:

1. Closed loop power regulation ensures that the output power is not easily drifting under load fluctuations, ensuring process consistency.

2. Fast arc detection and processing, instant power reduction when the chamber ignites, reducing damage to components inside the chamber.

3. Support multi-level pulse mode, which can flexibly adapt to the dynamic power requirements of different plasma processes.

4. Analog and digital dual interfaces facilitate remote setting and status feedback for device hosts.

5. Internal air duct optimization, air-cooled architecture, and reliable heat dissipation for long-term continuous operation in the workshop.

5 product parameters:

1. Rated output power of 5kW, standard operating frequency of 13.56MHz.

2. Three phase input 208-480VAC, suitable for semiconductor factory power supply environment.

3. The output impedance is 50 Ω, and the power regulation accuracy is controlled within ± 1%.

4. Standard 3U rack installation, forced air cooling for heat dissipation.

5. The working environment temperature is 0-45 ℃, suitable for clean equipment cabin operation.

5 application areas:

1. Plasma RF power supply for semiconductor etching equipment.

2. PVD thin film deposition equipment process power supply spare parts.

3. PECVD chemical vapor deposition equipment is used in conjunction with it.

4. replace the faulty power supply of the old wafer processing equipment.

5. Maintenance and replacement of plasma coating technology for flat panel displays.

Overall, this is a discontinued model, and the market mainly focuses on disassembling and refurbishing spare parts. Before purchasing and putting it on the machine, it is necessary to verify the equipment material number and confirm the match

AE 3155053-003射频发生器  产品展示

3155053-003.webp.jpg

视频展示


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SR3632-8292-84-7-56HC-CU531X307LTBAHG1IC3600TPSA1G1B
SR3632-8292-84-56HC-CU531X307LTBAFG1IC3600TPSA1

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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