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Varian E11604060运动控制底盘

发布时间:2026-09-14人气:
  • Varian E11604060运动控制底盘
  • Varian E11604060运动控制底盘
  • Varian E11604060运动控制底盘

Varian E11604060运动控制底盘  

1.产 品 资 料 介 绍:

做 Varian 离子注入机维护的同行,不少都用过 Varian E11604060 运动控制底盘,它是离子注入设备里承载晶圆台的精密运动基座,集成伺服驱动与位置反馈,负责晶圆高精度位移、定位,是机台运动系统的核心组件。
产品特点
1. 整体刚性强,高速移动时形变量小,保证晶圆定位重复精度
2. 洁净级机械设计,运动过程产尘低,满足半导体无尘车间标准
3. 集成多轴伺服联动,可同步完成平移、微调动作,适配掺杂工艺要求
4. 自带位置传感器闭环反馈,实时校正位置偏差,减少定位偏移
5. 原装成套结构,和 Varian 离子注入机主控匹配,现场拆装替换方便
产品参数
1. 适配设备:Varian 系列离子注入机
2. 支持多轴复合精密运动,承载晶圆载台组件
3. 具备纳米级位置微调能力,满足离子注入掺杂精度
4. 配套多路伺服信号接口与位置反馈通道
5. 工作环境 5℃~40℃,适配洁净车间工况
应用领域
1.Varian 离子注入机晶圆载台运动支撑
2. 晶圆掺杂工艺的精密定位与扫描
3. 离子束入射位置校准调节
4. 晶圆载台伺服运动单元配套
5.Varian 离子注入机备件维修更换
总的来说 Varian E11604060 运动控制底盘刚性好、定位精度高,离子注入机载台运动故障维修替换经常选用。

Varian E11604060运动控制底盘  产品英文介绍

Many colleagues who maintain Varian ion implantation machines have used the Varian E11604060 motion control chassis. It is a precision motion base that carries the wafer stage in ion implantation equipment, integrates servo drive and position feedback, and is responsible for high-precision wafer displacement and positioning. It is the core component of the machine motion system.

Product Features

1. Strong overall rigidity, small deformation during high-speed movement, ensuring repeated accuracy of wafer positioning

2. Clean grade mechanical design with low dust generation during operation, meeting the standards of semiconductor dust-free workshops

3. Integrated multi axis servo linkage, capable of synchronously completing translation and fine adjustment actions, suitable for doping process requirements

4. Equipped with position sensor closed-loop feedback, real-time correction of position deviation, reducing positioning deviation

5. Original complete set structure, matched with Varian ion implantation machine main control, easy to disassemble and replace on site

Product Specifications

1. Compatible equipment: Varian series ion implantation machine

2. Support multi axis composite precision motion, carrying wafer stage components

3. It has the ability to fine tune the position at the nanometer level, meeting the precision of ion implantation doping

4. Supporting multiple servo signal interfaces and position feedback channels

5. Working environment 5 ℃~40 ℃, suitable for clean workshop conditions

Application Areas

1. Motion support for wafer stage of Varian ion implantation machine

2. Precise positioning and scanning of wafer doping process

3. Calibration and adjustment of ion beam incidence position

4. Wafer stage servo motion unit matching

5. Maintenance and replacement of spare parts for Varian ion implantation machine

Overall, the Varian E11604060 motion control chassis has good rigidity and high positioning accuracy, and is often used for repairing and replacing motion faults in ion implantation aircraft.

Varian E11604060运动控制底盘   产品展示

E11604060.webp.jpg

视频展示


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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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