1.产 品 资 料 介 绍：
AE 3150861-011射频发生器 产品英文介绍
Most colleagues in the semiconductor RF power supply maintenance industry are familiar with the AE 3150861-011 RF generator. This AE VHF RF power supply outputs high-frequency RF power and is used to excite plasma. It is the core power supply spare part for etching chambers.
Product Features
1. High frequency power output is stable, with small power fluctuations when the plasma load changes, ensuring the repeatability of the etching process
2. Built in multiple protection functions, high reflected power, overheating, and overcurrent will trigger shutdown protection
3. Fast power control response, supports pulse modulation, and adapts to precise high-frequency plasma processes
4. Native matching machine communication protocol, stable signal interaction, easy and convenient on-site disassembly and replacement
5. Rack mounted compact structure saves cabinet installation space and facilitates maintenance and repair
Product Specifications
1. Operating frequency: VHF band
2. Rated output power 3500W
3. Input three-phase AC200V
4. Support communication between analog and digital buses
5. Forced air cooling for heat dissipation, with built-in temperature monitoring
Application Areas
1. VHF dry etching process for semiconductor wafers
2. RF power supply for high aspect ratio etching cavity
3. Thin film plasma surface treatment process
4. High frequency power supply for plasma cleaning equipment
5. Maintenance and replacement of spare parts for AE RF generator
Overall, AE 3150861-011 RF generator has stable high-frequency output and strong pulse control capability. It is often used for replacing RF faults in VHF etching chambers.
AE 3150861-011射频发生器 产品展示
视频展示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
