1.产 品 资 料 介 绍：
AE A3L5080BA140D211A射频发生器 产品英文介绍
The AE A3L5080BA140D211A RF generator is a commonly used RF power supply in semiconductor equipment, with stable plasma process output.
Product Features
Stable power output ensures consistency in each batch of processes.
Built in arc protection, quickly cuts off power when the chamber ignites.
Strong load adaptability to cope with fluctuations in cavity state.
Rack mounted installation, easy replacement of spare parts on site.
Comes with status feedback for quick troubleshooting.
Product Specifications
Model A3L5080BA140D211A RF generator.
Suitable for semiconductor plasma process chambers.
Standard 13.56MHz RF operating frequency.
Built in power sampling and reflection monitoring.
Support machine communication to read operational data.
Application Areas
Plasma excitation in semiconductor etching chamber.
PVD thin film deposition with RF power supply.
Replacement of power supply spare parts for old semiconductor machines.
Supporting equipment for cavity plasma cleaning.
Vacuum plasma surface treatment equipment.
This RF generator, when used in conjunction with an RF matching device, is a crucial power supply spare part in wafer processing equipment.
AE A3L5080BA140D211A射频发生器 产品展示
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The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218
